DRAM storage node profile measurement during high aspect ratio (HAR) etch has been one of the most challenging metrology steps. DRAM storage node profile affects refresh time and device electric ...

Almost a century ago the concept of measuring surface roughness started as a way to stop disputes and uncertainty between buyers and manufacturers. Today, it is a common identifier that is utilized ...

There are many specific instances where these parameters are required as quality control indicators and therefore are required to be measured. In the bakery industry, for example, loaf volume is the ...