Nanowerk

Atomic Layer Etching: Precise Nanoscale Material Removal

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
The Next Web

AlixLabs closes €15M Series A to commercialise the atomic etching technology

AlixLabs, the Lund-based semiconductor process startup developing Atomic Pitch Splitting (APS™), has completed its €15M Series A with a strategic top-up from Finnish investor Stephen Industries. The ...
EurekAlert!

Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors has been developed for the first time in the world

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
AZoM

Oxford Instruments Enables ROHM's In-House GaN Manufacturing with Advanced Etch Technology for 200 mm Production

Oxford Instruments, a leading provider of advanced plasma processing solutions for the compound semiconductor industry, today ...
Semiconductor Engineering

Advanced Atomistic Simulation Techniques For Atomic Layer Etching

Continuous downscaling of the critical dimensions in semiconductor devices is the cornerstone of technological revolution. As the technology nodes keep shrinking, innovations in fabrication ...
The Daily Californian

UC Berkeley nanofabrication lab receives cutting-edge semiconductor etching system

The Marvell Nanofabrication Laboratory at UC Berkeley recently received a donation of a multichamber semiconductor etching system from Lam Research. The etching system will be able to serve not only ...
Nanowerk

International Conference on Atomic Layer Deposition and Atomic Layer Etching (ALD/ALE 2026)

Specialized meeting on atomic-scale thin film growth and etching with strong industry engagement, tutorials and a tradeshow. Student Platinum Member $625; Regular Platinum Member $700; Student ...
Nature

Atomic layer etching of TiN by oxidation and SF6-H2 plasma exposure: ALE window defined by HF, H, and F

The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
AZOM

Advancements in Plasma Etching and Deposition Processes for Compound Semiconductor Materials Applications

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Nature

Establishment and modulation of linear VTH model with low interface states using atomic layer etching for E-mode GaN-based P-MOSFETs for digital logic application

The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
EurekAlert!

Laser machining is leading the way to atomic and close-to-atomic scale manufacturing

Laser machining, as one of the most significant micro/nano-manufacturing technologies, shows the capability of achieving ultimate accuracy, feature size and surface integrity at atomic scale. This has ...